Atomic Layer Deposition

Name: Atomic Layer Deposition
Author: David Cameron

David Cameron, Tommi Kaariainen, Marja-Leena Kaariainen, Arthur Sherman

John Wiley & Sons Inc

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.

Výběr knih autorů David Cameron , Tommi Kaariainen , Marja-Leena Kaariainen , Arthur Sherman